NEHRP Clearinghouse
- Title
- Development of Measurement Capability for Micro-Vibration Evaluations with Application to Chip Fabrication Facilities.
- File
- PB2000105993.pdf
- Author(s)
- Lee, G. C.; Liang, Z.; Song, J. W.; Shen, J. D.; Liu, W. C.
- Source
- National Science Foundation, Arlington, VA.; Erie County Industrial Development Agency, Buffalo, NY., December 1, 1999, 146 p.
- Identifying Number(s)
- MCEER-99-0020
- Abstract
- This report summarizes a study to measure micro-vibrations of ground motions at a proposed site to fabricate electronic IC chips. Current guidelines for semi-conductor fabrication facilities recommend that they be subjected to less than 100 micro-inches per second RMS (root-mean-square) velocity in every on-third octave frequency band with a preferred range of 60 to 70 micro-inches per second. The site under study is located near a major expressway, a train thoroughfare, and an active mining operation. The report also introduces the theoretical development for the relationship between frequency spectra and RMS values, which can be adopted for a wide range of applications on interpretations of the data obtained from up-to-date data acquisition systems.
- Keywords
- ; Root mean squares; Industrial plants; Earthquake resistant structures; Plant location; Semiconductors; Vibration; Frequency measurement; Integrated circuits; Ground motion; Frequency response testing; Plant layout; Soil structure interactions; Velocity; Seismicity; Chips (Electronics)